NCAFM2023 Programme Booklet

Thursday 1520-1540

REAL LIFE AFM APPLICATIONS AND EXPECTATIONS FOR HYBRID AFM

Sang-Joon Cho*, Byoung-Woon Ahn, Ah-Jin Jo

1 Application Technology Center, Park Systems Corp. Suwon, Korea Email: msjcho@parksystems.com

Atomic Force Microscopy (AFM) is arguably the most versatile and powerful 3rd generation microscopy technology for studying samples at the nanoscale. It is versatile because an AFM can not only image in three-dimensional topography but also provides various types of surface measurements to the needs of scientists and engineers. Over the past three decades, AFM has evolved into an ideal methodology for non-destructive sample scanning with longer tip life, higher accuracy, repeatability, and automation with Non-contact Method. The non-destructive measurement method opened the possibility of using AFM in the Semiconductor industry's nanometrology field. As the device size decreases, defects in the nanometer size of the wafer substrate may limit the device's performance. AFM has begun to be used to detect and accurately classify these defects. Recently another change in design rule allowed a new generation of AFM with additional degree of microscopic observation, a hybrid AFM, that combines AFM with optics with advanced functions and capabilities such as white light interferometry (WLI) and Photo-induced Force Microscopy (PiFM). Along the way, various AFM techniques were developed to study the structures and functions of the target sample. This presentation will introduce the contribution and prospects of the AFM technology to real-life applications and the expectations for future AFM technology development.

Fig. Real-Life Applications of Atomic Force Microscopy

83